1. SCI publication
  2. Patent
  3. Conference


9. Taesung kim, Jae-Boong Choi and Youngjin Kim, “Experimental Study of Nanoparticle Generation During High-Density Plasma Chemical Vapor Deposition of Poly Silicon films”, Journal of Korean Physical Society51, 3, 1187-1190, 2007

8. Taesung kim, S.K. Chae, “Application of Aerodynamic Lenses to In-Situ Particle Monitors(ISPM) for Higher Reliabilty in Semiconductor Fabrication Process”, Solid State Phenomena120, 273-278, 2007

7. O.C. Kwon, K.H. Lee, H.S. Ko, Taesung kim, “Stability limits of premixed methane-air microflames for micropower generation”, Key Engineering Materials326-328, part 2, 1133-1136, 2006

6. Taesung kim, H.S. Ko, O.C. Kwon, “Simulation assisted measurement of nanoparticle concentration generated during high-density plasma CVD of poly-silicon films”, Key Engineering Materials326-328, part 1, 349-352, 2006

5. H.S. Ko, S.S. Ahn, S.H. Baek, Taesung kim, “Development of combined optical system for thermal analysis of impinging flames”, Key Engineering Materials326-328, part 1, 71-74, 2006

4. R. M. Rassel, Taesung kim, Z. Shen, S. A. Campbell, P. H. McMurry, “Electrical properties of SiO2 films with embedded nanoparticles formed by SiH4/O2 chemical vapor deposition”, Journal of vacuum science and technology B21, 6, 2441-2447, 2003

3. Z. Shen, Taesung kim, U. Kortshagen, P. H. McMurry, S. A. Campbell, “Formation of highly uniform silicon nanoparticles in high density silane plasmas”, Journal of Applied Physics94, 4, 2277-2283, 2003

2. Taesung kim, S-M. Suh, S.L. Girshick, M. R. Zachariah, P. H. McMurry, R. M. Rassel, Z. Shen, S. A. Campbell, “Particle formation during low-pressure chemical vapor deposition from silane and oxygen; Measurements, modeling, and film properties”, Journal of Vacuum Science and Technology A20, 2, 413-423, 2002

1. N. P. Rao, S. Nijhawan, Taesung kim, Z. Wu, S. Campbell, D. Kittelson, P. McMurry, C. Cheng, E. Mastromatteo, “Investigation of particle generation during the low-pressure chemical vapor deposition of borophosphosilicate films”, Journal of the Electrochemical Society145, 6, 2051-2057, 1998